630 / 2019-03-18 14:17:44
High Performance W/n-Si Schottky Diode using Black Phosphorus as an Interlayer.
Schottky barrier height (SBH),Schottky diode,Black phosphorous,ideality factor
终稿
Priyanka Kumari / Indian Institute of Technology Bombay
V. Ramgopal Rao / Indian Institute of Technology Bombay (On lien) Serving IITD as Director
The novel application of mechanically exfoliated Black Phosphorus (BP) as an interlayer is explored for the first time in W/n-Si Schottky barrier diode (SBD). The SBD performance was significantly enhanced with an increase in Schottky barrier height from ~0.48 eV to ~0.59 eV, improvement in ideality factor from ~2 to ~1 and increase in ON/OFF ratio from ~102 to ~105 with BP interlayer at room temperature. The performance enhancement was found to be across a wide temperature range from 298K to 398K.
重要日期
  • 会议日期

    06月12日

    2019

    06月14日

    2019

  • 06月12日 2019

    初稿截稿日期

  • 06月14日 2019

    注册截止日期

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