472 / 2019-02-27 21:58:37
A Novel High-k LDMOS with Triangular Trench Field Plate
triangular trench field plate, breakdown voltage, specific on-resistance, High-k
终稿
Yu Deng / Nanjing University of Posts and Telecommunications
Jiafei Yao / Nanjing University of Posts and Telecommunications
Yufeng Guo / Nanjing University of Posts and Telecommunications
Zhenyu Zhang / Nanjing University of Posts and Telecommunications
This paper presents a High-k Lateral Diffused Metal Oxide Semiconductor (HK-LDMOS) with triangular trench field plate (TTFP-HK-LDMOS). The main feature of TTFP-HK-LDMOS is introducing two triangular trench field plate at both ends of the drift region. The distribution of surface electric field can be modulated by the triangular trench field plate, so that the breakdown voltage can be improved. The simulation results show that the breakdown voltage of TTFP-HK-LDMOS can reach 372V. Compare with HK-LDMOS breakdown voltage, TTFP-HK-LDMOS breakdown voltage increases 28.3%. Meanwhile, the TTFP-HK-LDMOS improved figure of merits which is 2.2 times in compared with HK-LDMOS.
重要日期
  • 会议日期

    06月12日

    2019

    06月14日

    2019

  • 06月12日 2019

    初稿截稿日期

  • 06月14日 2019

    注册截止日期

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