429 / 2019-02-26 22:28:03
Investigation of Phase Transformation in HfO2 Ferroelectric Capacitor by Means of a ZrO2 Capping Layer
ferroelectricity,hafnium oxide,zirconium oxide,phase transition
终稿
Chun-Hu Cheng / National Taiwan Normal University
Kuan-Wei Liu / National Chiao Tung University
Hsuan-Han Chen / National Chiao Tung University
Chih-Chieh Hsu / National Chiao Tung University
Zhong-Ying Huang / National Chiao Tung University
Wei-Chun Wang / National Chiao Tung University
Bing-Yang Shih / National Chiao Tung University
Szu-Yen Hsiung / National Chiao Tung University
Yi-Chun Tung / National Chiao Tung University
Yu-Chi Fan / National Taipei University of Technology
Ching-Liang Lin / National Taipei University of Technology
Tsung-Ming Lee / National Taipei University of Technology
Chia-Chi Fan / National Chiao Tung University
Hsiao-Hsuan Hsu / National Taipei University of Technology
Shih-An Wang / National Taiwan Normal University
Ti-You Huamg / National Taiwan Normal University
Chun-Yen Chang / National Chiao Tung University
Chien-Chung Lin / National Chiao Tung University
In this paper, the ferroelectric polarization effect of ZrO2 capping layer on HfO2 MFM capacitor was investigated. Based on crystallinity analysis, the phase transformation from monoclinic to orthorhombic phase in HfO2 film can be induced by a thin ZrO2 capping layer. The thickness of ZrO2 capping layer plays an important role in the ferroelectric polarization of HfO2 MFM capacitor. Compared to mixed HfZrO film, the stacked ZrO2/HfO2 film shows the advantage for suppressing the leakage issue during high-temperature ferroelectric phase transition.
重要日期
  • 会议日期

    06月12日

    2019

    06月14日

    2019

  • 06月12日 2019

    初稿截稿日期

  • 06月14日 2019

    注册截止日期

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