418 / 2019-02-26 11:04:09
Monolithically Integrated E/D InAlN/GaN HEMT And Inverters On Sapphire Substrate
InAlN/GaN HEMT,enhancement-mode/ depletion-mode,gate-recess,inverter
终稿
Gu Guodong / Hebei Semiconductor Research Institute
Dun Shaobo / Hebei Semiconductor Research Institute
Lv Yuanjie / Hebei Semiconductor Research Institute
Feng Zhihong / Hebei Semiconductor Research Institute
Zhang Zhirong / Hebei Semiconductor Research Institute
Guo Hongyu / Hebei Semiconductor Research Institute
GaN DFCL inverters by using integrated enhancement/depletion-mode (E/D-mode) InAlN/GaN HEMTs were fabricated and characterized. The E-mode InAlN/GaN HEMT was realized by utilizing low damage BCl3-based gate recess etching, which exhibits a high peak transconductance of 435mS/mm with a threshold voltage of 0.74V. At a supply of 2.5V, the E/D inverter shows an output logic swing of 2.19V, a logic-low noise margin of 0.54V and a logic-high noise margin of 1.38V.
重要日期
  • 会议日期

    06月12日

    2019

    06月14日

    2019

  • 06月12日 2019

    初稿截稿日期

  • 06月14日 2019

    注册截止日期

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