367 / 2019-01-12 14:27:38
Comparison of single and double channel AlGaN/GaN HEMTs and MOSHEMTs
Current collapse (CC),HEMT,MOSHEMT,2DEG (Two Dimentional Electron Gas)
终稿
Praveen Pal / Shaheed Rajguru College of Applied Sciences for Women, University of Delhi
Yogesh Pratap / Shaheed Rajguru College of Applied Sciences for Women, University of Delhi
Mridula Gupta / Semiconductor Device Research Laboratory
Sneha Kabra / Shaheed Rajguru College of Applied Sciences for Women, University of Delhi
In this paper, a comparative study of AlGaN/GaN high electron mobility transistors (HEMTs) with and metal oxide semiconductor HEMT (MOS-HEMT) has been carried out for both single channel and double channel devices. This paper shows that in double channel devices, lack of gate control is observed specifically for lower channel. Unilateral power gain, transconductance and gate – source capacitance is highest for single channel HEMT (SC-HEMT) whereas current gain, maximum frequency and cut-off frequency is higher for single channel MOS-HEMT (SC-MOSHEMT) device. Therefore, single channel devices are good for high power radio frequency applications and double channel devices are well and good to improve the breakdown voltage of the device.
重要日期
  • 会议日期

    06月12日

    2019

    06月14日

    2019

  • 06月12日 2019

    初稿截稿日期

  • 06月14日 2019

    注册截止日期

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