The resistive filamentation of a fast electron beam which is driven by a laser propagating in an aluminum target is studied through three-dimensional PIC-fluid hybrid simulation. The influence of laser intensity on filamentation instability is explored within a certain range  (). The simulation results indicate that laser intensity has a significant impact on the resistance of electron beams in solid targets to form filaments, and the self-generated magnetic field is the dominant factor that suppress filamentation instability. Under low-intensity laser irradiation, the electron beam filamentation can be completely suppressed by the self-generated magnetic field in an aluminum target, producing a strong collimated electron beam. When the laser intensity increases, the energy and number density of fast electrons both rise, but their impact on instability is opposite. Theoretical analysis is also conducted to obtain the linear growth rate of filamentation instability. The results show that increasing the electron number density can promote the filamentation instability, while increasing the energy or transverse temperature of electrons can inhibit the instability. When the laser intensity varies, these two mechanisms compete with each other. As the result, within the range of laser intensity that this paper focuses on, the change in growth rate is not significant. However, when the laser intensity is very high, a large spatial scale of divergence and a fine filamentary distribution are observed. The significant difference in filamentation phenomenon under different laser intensities is due to the distribution and scale differences of the self-generated magnetic field. This study indicates that by adjusting the parameters of fast electron beam through varying laser intensity, control over the filamentation instability of the electron beam propagating in a solid target can be achieved.
 

fast electrons transport,resistive filamentation instability