Non-destructive detection imaging system based on high-voltage micro-focus X-ray source has both high penetration and high resolution, which can be used in the field of imaging and diagnosis of tiny defects in special samples, etc. It also has a great demand in semiconductors, new energy, and upgrading of industrial manufacturing industries. The symmetric dumbbell ±300kV double-ended high-voltage ceramic socket structure, two-stage magnetic focusing, reflective tungsten target, to achieve a maximum voltage of 600kV micro-focused ray source, the minimum focal spot under the target power ≥10W. Preliminary imaging experiments were carried out, the dual-filament image quality meter to obtain the results of the MTF=0.2@19LP/mm, TYPE 18D wire to the card to obtain the resolution of 20LP/mm Results. Its radiation uniformity meets the design requirement of ±15°.

micro-focus,X-ray source,nondestructive detection