Plasma Preparation of Graphene and Hydrogen with Different Etching Gases for Energy Storage
编号:475 访问权限:仅限参会人 更新:2022-05-21 15:38:20 浏览:156次 张贴报告

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摘要
In the previous research of our group, much effects have been made: a process for one-step preparation of graphene nanosheet (GN) by using AC gliding arc plasma in an Ar-H2-CH4 was developed. In this work, we also used argon as the plasma forming gas, and CO2 as etching gas to influence the nucleation and growth process of the product by means of forming different C-X bonds, and graphene were obtained. In addition, the GN prepared in the Ar-H2-CH4 environment was used as a conductive additive for LiFePO4 (LFP) cathode of LIB materials.
 
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报告人
陈剑/Jian Chen
福州大学

Jian Chen received the B.S. degree in Automation from Zhengzhou University, Zhengzhou, China, in 2000 and the M.S. degree in Control theory and control engineering from Jiangnan University, Wuxi, China, in 2004. And she received the Ph.D. degree in Power electronics and power transmission with the School of electrical engineering and automation, Fuzhou University, Fuzhou, China. Her research interests include power electronics systems, intelligent control and data driven industrial control schemes.

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重要日期
  • 会议日期

    05月27日

    2022

    05月29日

    2022

  • 02月28日 2022

    初稿截稿日期

  • 05月29日 2022

    注册截止日期

  • 06月22日 2022

    报告提交截止日期

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China Electrotechnical Society
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