36 / 2021-06-28 16:12:34
Facile Construction of High-Quality Boron-Doped Diamond Film with 3D Interconnected Porous Microstructure for Boosting Electrochemical Performance
"Chemical vapor deposition (CVD)",boron doped diamond,porous
摘要录用
志刚 卢 / 中国科学院金属研究所
楠 黄 / 中国科学院金属研究所
辛 姜 / 中国科学院金属研究所
Development of high-quality porous BDD film is of significant to materials science and technology due to its intriguing physical and chemical properties, however, inescapable emergence of non-diamond carbon (NDC) during the deposition of porous BDD makes it an arduous challenge. In this contribution, we proposed a new template-free way to controllably fabricate a series of 3D porous BDD films through chemical vapor deposition (CVD) of different diamond/NDC ratio of composite films and complete remove of NDC. The porous BDD films shown the excellent structure properties, such as NDC-free diamond, 3D interconnected porous microstructure and tunable pore size, as well as boosting electrochemical properties (high oxygen evolution potential (>1.8V), accelerated electron transfer rate and 390-870 folds improvement of capacitive current). The marriage of the superior microstructure and unprecedented electrochemical properties makes the porous BDD films promising electrodes for electrochemical applications in double-layer capacitor. The large capacitance of 17.54 mF/cm2 in diamond electrodes and 100% of capacitive retention were obtained, this resulted from the significant enhanced effective electroactive surface area, speed-up diffusion of electrolyte and excellent structural stability of the porous BDD electrode. Overall, the new method bridges the gap in simultaneous acquiring high-quality diamond and large surface area for the fabrication of BDD film and proposed a promising candidate in the various electrochemical applications.
重要日期
  • 会议日期

    12月03日

    2021

    12月05日

    2021

  • 07月25日 2021

    提前注册日期

  • 12月01日 2021

    初稿截稿日期

  • 12月03日 2021

    注册截止日期

主办单位
中国机械工程学会表面工程分会
承办单位
山东理工大学
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